Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry
- 1 February 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 313-314, 398-405
- https://doi.org/10.1016/s0040-6090(97)00854-7
Abstract
No abstract availableKeywords
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