Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films
- 1 August 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 78 (3) , 1673-1680
- https://doi.org/10.1063/1.360263
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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