Room temperature negative bias instability in silicon dioxide films grown in the presence of O2-trichloroethylene
- 1 April 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 67 (1) , 29-34
- https://doi.org/10.1016/0040-6090(80)90283-7
Abstract
No abstract availableKeywords
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