Ellipsometry measurements on SiO2 films for thicknesses under 200Å
- 30 September 1987
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 30 (9) , 973-981
- https://doi.org/10.1016/0038-1101(87)90134-1
Abstract
No abstract availableKeywords
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