Observations on intensity oscillations in reflection high-energy electron diffraction during gas source molecular beam epitaxy of InP

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Abstract
We report the first observation of reflection high-energy electron diffraction intensity oscillations during the growth of InP using trimethylindium and phosphine in gas source molecular beam epitaxy (GSMBE). By optimizing the growth conditions, intensity oscillations more than 700 periods have been observed. The temperature and flux dependence of the oscillating behavior have been studied. Results indicate that the growth of InP by GSMBE is predominantly via a two-dimensional layer-by-layer mode.