Growth of thin films of refractory silicides on Si(100) in ultrahigh vacuum
- 1 April 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 126 (3-4) , 233-239
- https://doi.org/10.1016/0040-6090(85)90316-5
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Low Resistivity Thin Film Refractory Silicides Grown in Ultrahigh Vacuum at Low TemperatureJournal of the Electrochemical Society, 1984
- Revue de LivresJournal de Physique, 1983
- Properties of MoSi2 and WSi2, magnetron cosputtered from elemental targetsJournal of Electronic Materials, 1982
- Refractory silicides for integrated circuitsJournal of Vacuum Science and Technology, 1980
- Thin-film Mo-Si interactionApplied Physics Letters, 1979