Effect of gate length on DC performance of AlGaN/GaN HEMTs grown by MBE
- 16 October 2001
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 45 (12) , 1979-1985
- https://doi.org/10.1016/s0038-1101(01)00255-6
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- AlGaN/GaN high electron mobility transistors on Si(111) substratesIEEE Transactions on Electron Devices, 2001
- Microwave performance of AlGaN/GaN metal insulator semiconductor field effect transistors on sapphire substratesIEEE Transactions on Electron Devices, 2001
- Current instabilities in GaN-based devicesIEEE Electron Device Letters, 2001
- Large periphery high-power AlGaN/GaN metal-oxide-semiconductor heterostructure field effect transistors on SiC with oxide-bridgingIEEE Electron Device Letters, 2001
- High-frequency characterization of sub-0.25-/spl mu/m fully depleted silicon-on-insulator MOSFETsIEEE Electron Device Letters, 2000
- High breakdown GaN HEMT with overlapping gate structureIEEE Electron Device Letters, 2000
- AlGaN/GaN metal–oxide–semiconductor heterostructure field-effect transistors on SiC substratesApplied Physics Letters, 2000
- Polarization effects in nitride semiconductor device structures and performance of modulation doped field effect transistorsSolid-State Electronics, 1999
- Drain current compression in GaN MODFETs underlarge-signalmodulation at microwave frequenciesElectronics Letters, 1999
- GaN: Processing, defects, and devicesJournal of Applied Physics, 1999