High-reflectance AlPSb/GaPSb distributed Bragg reflectormirrors on InP grown by gas-source molecular beam epitaxy
- 17 February 1994
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 30 (4) , 314-315
- https://doi.org/10.1049/el:19940230
Abstract
Large relractive-index difference, 1.55 µm distributed Bragg reflectors, using AlPSb and GaPSb lattice matched to InP, are demonstrated. This is the first report of AlPSb/GaPSb quarter-wave distributed Bragg reflectors. This mirror structure will be useful for InP-based surface-emitting laser applications at long wavelengths.Keywords
This publication has 9 references indexed in Scilit:
- VSTEP-based smart pixelsIEEE Journal of Quantum Electronics, 1993
- GaPSb: A new ternary material for Schottky diode fabrication on InPApplied Physics Letters, 1991
- Molecular beam epitaxy of AlAs0.16Sb0.84 and Al0.8Ga0.2As0.14Sb0.86 on InAs substratesApplied Physics Letters, 1990
- High-reflectivity AlAs 0.52 Sb 0.48 /GaInAs(P) distributed Bragg mirror on InP substrate for 1.3–1.55 µm wavelengthsElectronics Letters, 1989
- Surface emitting semiconductor lasersIEEE Journal of Quantum Electronics, 1988
- Chemical beam epitaxially grown InP/InGaAsP interference mirror for use near 1.55 μm wavelengthApplied Physics Letters, 1987
- Epitaxial Semiconductor Optical Interference DevicesPublished by SPIE-Intl Soc Optical Eng ,1987
- Refractive indices of III–V compounds: Key properties of InGaAsP relevant to device designJournal of Applied Physics, 1982
- Molecular-beam epitaxy (MBE) of In1−xGaxAs and GaSb1−yAsyApplied Physics Letters, 1977