The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping
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- 14 July 2004
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 14 (10) , 1384-1389
- https://doi.org/10.1088/0960-1317/14/10/013
Abstract
No abstract availableThis publication has 35 references indexed in Scilit:
- A tapered hollow metallic microneedle array using backside exposure of SU-8Journal of Micromechanics and Microengineering, 2004
- Monolithic coupling of a SU8 waveguide to a silicon photodiodeJournal of Applied Physics, 2003
- Micromachined SU8 negative resist for MMIC applications on low resistivity CMOS substratesMicroelectronic Engineering, 2003
- Movable vertical mirror arrays for optical microswitch matrixes and their electromagnetic actuationIEEE Journal of Selected Topics in Quantum Electronics, 2002
- SU8-micromechanical structures with in situ fabricated movable partsMicrosystem Technologies, 2002
- A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresistJournal of Micromechanics and Microengineering, 2002
- SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMSMicroelectronics Journal, 2002
- New formation technology for a plasma display panel barrier-rib structure using a precise metal mold fabricated by the UV-LIGA processJournal of Micromechanics and Microengineering, 2001
- Cell Placement and Neural Guidance Using a Three-Dimensional Microfluidic ArrayJapanese Journal of Applied Physics, 2001
- High aspect ratio micromachining (HARM) technologies for microinertial devicesMicrosystem Technologies, 2000