High-power 400-nm-band AlGaInN-based laser diodes with low aspect ratio
- 13 May 2002
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 80 (19) , 3497-3499
- https://doi.org/10.1063/1.1478157
Abstract
High-power blue-violet laser diodes with aspect ratio as low as 2.3 and threshold current down to 33 mA have been realized. The relationship between threshold current and optical confinement factor was investigated in order to minimize the beam divergence angle perpendicular to the junction plane (θ⊥). θ⊥ was found to decrease with reduction of the optical confinement factor, whereas threshold current density increased. A new layer structure, in which a p-typed cladding layer was located next to an AlGaN electron blocking layer, and a GaInN guiding layer was inserted between the active and the AlGaN electron blocking layer, was effective for obtaining small θ⊥ while maintaining low threshold current.Keywords
This publication has 8 references indexed in Scilit:
- GaN-Based High Power Blue-Violet Laser DiodesJapanese Journal of Applied Physics, 2001
- AlGaInN high-power lasers grown on an ELO-GaN layerJournal of Crystal Growth, 2000
- High-Power and Long-Lifetime InGaN Multi-Quantum-Well Laser Diodes Grown on Low-Dislocation-Density GaN SubstratesJapanese Journal of Applied Physics, 2000
- Room-Temperature Continuous-Wave Operation of InGaN Multi-Quantum-Well Laser Diodes Grown on an n-GaN Substrate with a Backside n-ContactJapanese Journal of Applied Physics, 1999
- InGaN/GaN/AlGaN-Based Laser Diodes with Modulation-Doped Strained-Layer SuperlatticesJapanese Journal of Applied Physics, 1997
- Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1997
- UV Laser Irradiation Effects on Frequency of Surface Acoustic Wave (SAW) Filters Coated with Titanium Oxide FilmsJapanese Journal of Applied Physics, 1997
- InGaN-Based Multi-Quantum-Well-Structure Laser DiodesJapanese Journal of Applied Physics, 1996