Growth and properties of high-mobility two-dimensional hole gases in Ge on relaxed Si/SiGe, Ge/SiGe buffers and Ge substrates
- 1 May 1995
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 150, 1011-1014
- https://doi.org/10.1016/0022-0248(95)80092-q
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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