Electron Paramagnetic Resonance Studies of Defects in Oxygen-Implanted Silicon

Abstract
Electron paramagnetic resonance measurements have been carried out on oxygen-implanted silicon at room temperatures. The EPR spectra composed of three isotropic lines are observed for the ion-dose range between 2×1017and 1.8×1018cm-2. They are ascribed to the dangling bonds in amorphous Si, to the defects in SiO2and to defects at the Si/SiO2interface. The EPR spectra ascribed to the defects in the Si/SiO2interface are found to differ from those arising from the Pb centre and from the defects at the Si/SiO2interface formed by oxygen ion implantation at high temperature.