Decomposition of SiCl4 and deposition of Si in inductively coupled plasmas of H2+SiCl4
- 1 June 1987
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 7 (2) , 169-179
- https://doi.org/10.1007/bf01019176
Abstract
No abstract availableKeywords
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