Reactive ion etching of Nb/A1Ox/Nb for Josephson technology
- 1 December 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 206 (1-2) , 151-155
- https://doi.org/10.1016/0040-6090(91)90411-p
Abstract
No abstract availableKeywords
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