Esd Robustness And Scaling Implications Of Aluminum And Copper Interconnects In Advanced Semiconductor Technology
- 1 January 1997
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
ESD testing results of aluminum and copper interconnect wires and vias for advanced semiconductor technologies demonstrate that interconnects will be a limiting failure mechanism in the future for ESD robustness of semiconductor chips. Comparison of copper and aluminum interconnect and via ESD robustness and failure mechanisms will be shown. Results demonstrate an improvement in the ESD robustness of a Cu-based interconnect system, compared to AI-based interconnects, with an improvement in the critical current, in the human body and machine model time regimes.Keywords
This publication has 13 references indexed in Scilit:
- Dual Damascene: a ULSI wiring technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Interconnect scaling-the real limiter to high performance ULSIPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- VLSI on-chip interconnection performance simulations and measurementsIBM Journal of Research and Development, 1995
- The evolution of interconnection technology at IBMIBM Journal of Research and Development, 1995
- The impact of technology scaling on ESD robustness and protection circuit designIEEE Transactions on Components, Packaging, and Manufacturing Technology: Part A, 1995
- Performance trends in high-end processorsProceedings of the IEEE, 1995
- Scaling, optimization and design considerations of electrostatic discharge protection circuits in CMOS technologyJournal of Electrostatics, 1994
- Performance consideration for the scaling of submicron on-chip interconnectionsPublished by SPIE-Intl Soc Optical Eng ,1993
- The Need For Low Resistance Interconnects In Future High-Speed SystemsPublished by SPIE-Intl Soc Optical Eng ,1988
- Pulse Power Failure Modes in SemiconductorsIEEE Transactions on Nuclear Science, 1970