Secondary-neutral and secondary-ion mass spectrometry analysis of TiN-based hard coatings: an assessment of quantification procedures
- 1 October 1994
- journal article
- Published by Elsevier in Analytica Chimica Acta
- Vol. 297 (1-2) , 277-283
- https://doi.org/10.1016/0003-2670(93)e0626-i
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Basic requirements for quantitative SIMS analysis using cesium bombardment and detection of MCs+ secondary ionsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992
- Noval detection scheme for the analysis of hydrogen and helium by secondary ion mass spectrometrySurface and Interface Analysis, 1991
- SIMS depth profile analysis using MCs+ molecular ionsAnalytical and Bioanalytical Chemistry, 1991
- On the use of CsX+ cluster ions for major element depth profiling in secondary ion mass spectrometryInternational Journal of Mass Spectrometry and Ion Processes, 1990
- A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+Journal of Applied Physics, 1988
- Relative elemental sensitivity factors in secondary neutral mass spectrometryJournal of Vacuum Science & Technology A, 1988
- Angular distribution of particles sputtered from metals and alloysJournal of Vacuum Science & Technology A, 1988
- Recent applications of secondary neutral mass spectrometry for quantitative analysis of homogeneous and structured samplesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Quantitative analysis and depth profiling of rare gases in solids by secondary-ion mass spectrometry: Detection of (CsR)+ molecular ions (R=rare gas)Journal of Vacuum Science & Technology A, 1988
- Evaluation of a cesium positive ion source for secondary ion mass spectrometryAnalytical Chemistry, 1977