Rate-determining reactions and surface species in CVD silicon: IV. The SiCl4-H2-N2 and the SiHCl3-H2-N2 system
- 31 March 1982
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 57 (1) , 177-184
- https://doi.org/10.1016/0022-0248(82)90264-0
Abstract
No abstract availableKeywords
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