Performance and V/sub dd/ scaling in deep submicrometer CMOS
- 1 January 1998
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Solid-State Circuits
- Vol. 33 (10) , 1586-1589
- https://doi.org/10.1109/4.720410
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Experimental confirmation of an accurate CMOS gate delay model for gate oxide and voltage scalingIEEE Electron Device Letters, 1997
- Predicting CMOS speed with gate oxide and voltage scaling and interconnect loading effectsIEEE Transactions on Electron Devices, 1997
- MOSFET carrier mobility model based on gate oxide thickness, threshold and gate voltagesSolid-State Electronics, 1996
- An accurate semi-empirical saturation drain current model for LDD n-MOSFETIEEE Electron Device Letters, 1996
- Device and Technology Impact on Low Power ElectronicsPublished by Springer Nature ,1996
- CMOS scaling for high performance and low power-the next ten yearsProceedings of the IEEE, 1995
- Minimizing power consumption in digital CMOS circuitsProceedings of the IEEE, 1995