Chemically-assisted ion-beam etching of (AlGa)As/GaAs: lattice damage and removal by in-situ Cl2 treatment
- 1 February 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 45 (1) , 9-14
- https://doi.org/10.1016/s0167-9317(98)00256-1
Abstract
No abstract availableKeywords
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