Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model
- 1 October 1994
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 45 (1) , 85-89
- https://doi.org/10.1016/0924-4247(94)00820-5
Abstract
No abstract availableKeywords
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