The deposition of aluminum thin films by CVD using a novel adduct of dimethylaluminum hydride
- 1 July 1995
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 1 (1) , 24-26
- https://doi.org/10.1002/cvde.19950010104
Abstract
No abstract availableKeywords
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