A minimum total power methodology for projecting limits on CMOS GSI
- 1 June 2000
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Very Large Scale Integration (VLSI) Systems
- Vol. 8 (3) , 235-251
- https://doi.org/10.1109/92.845891
Abstract
A circuit design methodology minimizing total power drain of a static complementary metal-oxide-semiconductor (CMOS) random logic network for a prescribed performance, operating temperature range, and short channel threshold voltage rolloff is investigated. Physical, continuous, smooth, and compact "transregional" MOSFET drain current models that consider high-field effects in scaled devices and permit tradeoffs between saturation drive current and subthreshold leakage current are employed to model CMOS circuit performance and power dissipation at low voltages. Transregional models are used in conjunction with physical short channel MOSFET threshold voltage rolloff models and stochastic interconnect distributions to project optimal supply voltages, threshold voltages, and device channel widths minimizing total power dissipated by CMOS logic circuits for each National Technology Roadmap for Semiconductors (NTRS) technology generation. Optimum supply voltage, corresponding to minimum total power dissipation, is projected to scale to 510 mV for the 50-nm 10-GHz CMOS generation in the year 2012. Techniques exploiting datapath parallelism to further scale the supply voltage are shown to offer decreasing reductions in power dissipation with technology scaling.Keywords
This publication has 19 references indexed in Scilit:
- A 200 mV self-testing encoder/decoder using Stanford ultra-low-power CMOSPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Low-power digital designPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Supply and threshold voltage optimization for low power designPublished by Association for Computing Machinery (ACM) ,1997
- Performance trends in high-end processorsProceedings of the IEEE, 1995
- Multilevel metal capacitance models for CAD design synthesis systemsIEEE Electron Device Letters, 1992
- A simple model for scaled MOS transistors that includes field-dependent mobilityIEEE Journal of Solid-State Circuits, 1987
- Performance Limits of CMOS ULSIIEEE Journal of Solid-State Circuits, 1985
- The wire-limited logic chipIEEE Journal of Solid-State Circuits, 1982
- Unified field-effect transistor theory including velocity saturationIEEE Journal of Solid-State Circuits, 1980
- A review of some charge transport properties of siliconSolid-State Electronics, 1977