Production of Microstructures by Laser Pyrolysis
- 1 January 1982
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
Laser pyrolysis at short wavelengths is a powerful tool for micron-sized one-step local deposition of insulating, semiconducting and metallic materials from the gas phase. Various structures, e.g. stripes on different substrates, and rods of various lengths and diameters, have been produced. The morphology of the deposited material, the deposition rate, and the dimensions (typically 1-300 μm) of the structures were investigated quantitatively as functions of laser irradiance local temperature, laser focus diameter, scanning velocity, and gas pressure.Keywords
This publication has 11 references indexed in Scilit:
- Ar+ laser induced chemical vapor deposition of Si from SiH4Applied Physics Letters, 1982
- Cadmium deposition on transparent substrates by laser induced dissociation of Cd(CH3)2 at visible wavelengthsApplied Physics A, 1982
- Laser microreaction for deposition of doped silicon filmsApplied Physics Letters, 1981
- Laser induced chemical vapor deposition of carbonApplied Physics Letters, 1981
- Temperature dependence of the reflectance of solid and liquid siliconJournal of Applied Physics, 1981
- Laser microphotochemistry for use in solid-state electronicsIEEE Journal of Quantum Electronics, 1980
- Laser-induced chemical vapor deposition of polycrystalline Si from SiCl4Applied Physics Letters, 1980
- Abstract: Laser chemical vapor deposition of metals and insulatorsJournal of Vacuum Science and Technology, 1979
- Chemical vapor deposition of silicon using a CO2 laserApplied Physics Letters, 1978
- The pyrolysis of monosilaneProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1966