Recent Advances in X-Ray Lithography

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Abstract
We report some significant developments in the area of X-ray technology, in the area of the modeling of image formation, in distortion control and in mask replication. Early simple models have been replaced by complete optical calculations based on physical optics and including all relevant factors. These models provide good agreement with the available experimental results. In the area of mask distortions, the use of finite element analysis models has clarified the roles played by the various sources of stress and explained in greater detail the origin of temperature changes. These progresses have paved the way to the optimization of the exposure system and to the achievement of the large exposure latitude potential of X-ray lithography.

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