Nonreciprocal laser-microchemical processing: Spatial resolution limits and demonstration of 0.2-μm linewidths
- 15 January 1984
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 44 (2) , 267-269
- https://doi.org/10.1063/1.94694
Abstract
A simple model, which includes the important effects of ‘‘nonreciprocity’’ (nonlinear dependence on intensity), is developed to describe the spatial resolution of single-step focused-beam, microchemical fabrication techniques. Qualitative comparisons are made to patterning by double-step (resist) and by projected-image processes. At a given wavelength, linewidths are shown to be narrowest for microchemical processes. Linewidths <0.2 μm, i.e., narrower than the Rayleigh optical diffraction limit, are demonstrated for laser-activated deposition and doping of silicon at visible wavelengths.Keywords
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