Fabrication of High Aspect Ratio Poly(ethylene glycol)-Containing Microstructures by UV Embossing
- 15 April 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 19 (10) , 4371-4380
- https://doi.org/10.1021/la026967t
Abstract
No abstract availableKeywords
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