Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon
- 1 September 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (5) , 2802-2805
- https://doi.org/10.1116/1.590275
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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