Effect of substrate bias on the properties of microcrystalline silicon films deposited in a glow discharge
- 1 May 1982
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 42 (6) , 465-468
- https://doi.org/10.1016/0038-1098(82)90974-7
Abstract
No abstract availableKeywords
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