Minority-carrier hole diffusion length in heavily-doped polysilicon and its influence on polysilicon-emitter transistors
- 1 July 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (7) , 1045-1054
- https://doi.org/10.1109/16.3363
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
- Coulomb Damped Relaxation Oscillations in Semiconductor Quantum Dot LasersPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2006
- Measurement of hole mobility in heavily doped n-type siliconIEEE Electron Device Letters, 1986
- A thermionic-diffusion model of polysilicon emitterPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1986
- Influence of hydrogen implantation on the resistivity of polycrystalline siliconJournal of Applied Physics, 1985
- Impact of processing parameters on base current in polysilicon contacted bipolar transistorsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1985
- An empirical fit to minority hole mobilitiesIEEE Electron Device Letters, 1984
- Between carrier distributions and dopant atomic distribution in beveled silicon substratesJournal of Applied Physics, 1982
- Modeling and measurement of minority-carrier lifetime versus doping in diffused layers of n+-p silicon diodesIEEE Transactions on Electron Devices, 1982
- Electron and hole mobilities in silicon as a function of concentration and temperatureIEEE Transactions on Electron Devices, 1982
- A polysilicon base bipolar transistorPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1979