High T c thin films with roughness smaller than one unit cell
- 6 January 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 60 (1) , 120-122
- https://doi.org/10.1063/1.107343
Abstract
We have developed a method for the growth of epitaxial high Tc superconducting thin films with roughness smaller than one unit cell using conventional magnetron sputtering. In this method the substrate is positioned above one edge of the target (off axis) to avoid resputtering, and oscillated back and forth between the two symmetrical edges of the target to improve film thickness homogeneity. Finite size peaks in the x-ray diffraction spectra of thin GdBa2Cu3O7−δ films and satellite peaks on a GdBa2Cu3O7−δ/YBa2Cu3O7−δ superlattice show the excellent thickness control and smoothness obtained with this technique.Keywords
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