Atomistic origins of light-induced defects ina-Si
- 23 March 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 68 (12) , 1888-1891
- https://doi.org/10.1103/physrevlett.68.1888
Abstract
We present an atomistic model of light-induced defects (the Staebler-Wronski effect). The model is based in part on our observations of molecular-dynamics simulations with an ab initio code and requires a change in the charge of a well-localized state in the gap, such as a dangling bond, to nucleate a defect. The defects are formed at weak-bond sites in the network following a rearrangement caused by the change of the charge of the localized state.Keywords
This publication has 20 references indexed in Scilit:
- Light-enhanced hydrogen motion ina-Si:HPhysical Review Letters, 1991
- Enhancement of light-induced degradation in hydrogenated amorphous silicon due to carbon impuritiesApplied Physics Letters, 1991
- An Alternative Model for the Kinetics of Light-Induced Defects in A-Si:HMRS Proceedings, 1991
- Role of band-tail carriers in metastable defect formation and annealing in hydrogenated amorphous siliconPhysical Review B, 1990
- Saturation of the light-induced defect density in hydrogenated amorphous siliconApplied Physics Letters, 1989
- Structure and Electronic States in Disordered SystemsPhysical Review Letters, 1986
- Light-induced metastable defects in hydrogenated amorphous silicon: A systematic studyPhysical Review B, 1985
- Microscopic model of the Staebler-Wronski effect in intrinsic amorphous hydrogenated siliconPhilosophical Magazine Part B, 1985
- DEFECTS IN AMORPHOUS CHALCOGENIDES AND SILICONLe Journal de Physique Colloques, 1981
- Reversible conductivity changes in discharge-produced amorphous SiApplied Physics Letters, 1977