Modeling magnetic fields of magnetron sputtering systems
- 10 December 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 49 (1-3) , 121-126
- https://doi.org/10.1016/0257-8972(91)90042-u
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering systemSurface and Coatings Technology, 1990
- Absence of negative ion effects during on-axis single target sputter depositions of Y-Ba-Cu-O thin films on Si (100)Applied Physics Letters, 1990
- Ion-assisting magnetron sources: Principles and usesJournal of Vacuum Science & Technology A, 1990
- Sputtering systems with magnetically enhanced ionization for ion plating of TiN filmsJournal of Vacuum Science & Technology A, 1990
- The design and performance of planar magnetron sputtering cathodesVacuum, 1987