Luminescence of laterally ordered Ge islands along 〈100〉 directions
- 15 June 2002
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 91 (12) , 10119-10126
- https://doi.org/10.1063/1.1481205
Abstract
The optical properties of coherently strained, self-ordered Ge islands are analyzed in connection with their size distribution. The ordering was achieved by depositing Ge on Si mesas oriented parallel to 〈100〉 directions and grown by selective epitaxy on Si(001) using low pressure chemical vapor deposition. The spontaneous ordered nucleation of Ge islands along mesa edges is driven by the presence of tensile strain at the periphery of the mesas. All photoluminescence peaks of the islands as well as of the wetting layer are well resolved. The emission peaks of ordered islands could be separated from the emission of randomly distributed islands on the (001) plane by varying the width of the straight mesa lines. The peaks of ordered islands are narrower than from random islands in agreement with the atomic force microscopy analysis. This effect is due to the strong island–island interaction in the one-dimensional row. The emission is governed at low temperature by hole transfer from the wetting layer to the islands, and at higher temperature by hole transfer from the islands to the wetting layer.This publication has 25 references indexed in Scilit:
- Size distribution and optical properties of self-assembled Ge on SiApplied Physics A, 2000
- Ordered nucleation of Ge islands along high index planes on SiMaterials Science and Engineering: B, 2000
- Controlled arrangement of self-organized Ge islands on patterned Si (001) substratesApplied Physics Letters, 1999
- Self-aligning of self-assembled Ge islands on Si(001)Nanotechnology, 1999
- Mechanism of the Preferential Edge-Positioning of Self-Organized Ge Quantum Dots on Si MesasMRS Proceedings, 1999
- Morphological transition of Ge islands on Si(001) grown by LPCVDMRS Proceedings, 1999
- Lateral ordering of Ge islands along facetsJournal of Crystal Growth, 1998
- Lithographic positioning of self-assembled Ge islands on Si(001)Applied Physics Letters, 1997
- Lateral confinement by low pressure chemical vapor deposition-based selective epitaxial growth of Si1−xGex/Si nanostructuresJournal of Applied Physics, 1997
- Formation of Heterogeneous Thickness Modulations During Epitaxial Growth of LPCVD-Si1−xGex/Si Quantum Well StructuresMRS Proceedings, 1992