Systematics of Silicide Formation by High Dose Miplantation of Transition Metals into Si
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Nuclear resonance profiling of high dose implants of Al in SiNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Formation of Buried Sio2 By High Dose Implantation of Oxygen at Room and Liquid Nitroeen TemperaturesMRS Proceedings, 1985
- High Dose Implantation of Nickel into SiliconMRS Proceedings, 1985
- Gettering of Impurities during High Dose Implantation of Al or Cr into Si and the Resulting Effect on Structure and CompositionMRS Proceedings, 1984
- Prediction of Silicide First Phase and Phase Sequence from Heats of FormationMRS Proceedings, 1983
- Phase Formation and Kinetic Processes in Silicide Growth.MRS Proceedings, 1983
- Growth kinetics of planar binary diffusion couples: ’’Thin-film case’’ versus ’’bulk cases’’Journal of Applied Physics, 1982
- Ion-beam-induced reactions in metal-semiconductor and metal-metal thin film structuresNuclear Instruments and Methods, 1981
- Study of buried silicon nitride layers synthesized by ion implantationJournal of Applied Physics, 1980
- First phase nucleation in silicon–transition-metal planar interfacesApplied Physics Letters, 1976