Test structure and methodology for experimental extraction of threshold voltage shifts due to quantum mechanical effects in MOS inversion layers
- 22 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Effects of quantization on the electrical characteristics of deep submicron p- and n-MOSFETsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Determination of ultra-thin gate oxide thicknesses for CMOS structures using quantum effectsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- A computationally efficient model for inversion layer quantization effects in deep submicron N-channel MOSFETsIEEE Transactions on Electron Devices, 1996
- A simple model for quantisation effects in heavily-doped silicon MOSFETs at inversion conditionsSolid-State Electronics, 1994
- Influence of high substrate doping levels on the threshold voltage and the mobility of deep-submicrometer MOSFETsIEEE Transactions on Electron Devices, 1992
- Quantum effects in Si n-MOS inversion layer at high substrate concentrationSolid-State Electronics, 1990
- Electronic properties of two-dimensional systemsReviews of Modern Physics, 1982