Integration of surface-micromachined polysilicon mirrors and a standard CMOS process
- 30 April 1996
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 52 (1-3) , 140-144
- https://doi.org/10.1016/0924-4247(96)80139-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Micromechanics compatible with an 0.8 μm CMOS processSensors and Actuators A: Physical, 1995
- Process technology for the modular integration of CMOS and polysilicon microstructuresMicrosystem Technologies, 1994
- Electrostatically deflectable polysilicon torsional mirrorsSensors and Actuators A: Physical, 1994
- Line-addressable torsional micromirrors for light modulator arraysSensors and Actuators A: Physical, 1994
- Investigations on free-standing polysilicon beams in view of their application as transducersSensors and Actuators A: Physical, 1990
- Process Integration for active polysilicon resonant microstructuresSensors and Actuators, 1989