Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9film growth

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Abstract
The thermodynamic stability of Pt/Ti/SiO2/Si, Pt/TiO2/SiO2/Si, Pt/Ta/SiO2/Si, Ir/SiO2/Si, and RuO2/SiO2/Si electrode layers has been studied using mass spectroscopy of recoiled ions (MSRI), a new technique which provides monolayer-specific in situ surface analysis under conditions of modest oxygen partial pressures required for oxide film growth using sputter-deposition. Results of the initial stages of growth of SrBi2Ta2O9 films on the various substrates listed above are presented also. It is found that the initial growth of SrBi2Ta2O9 films strongly depends on the composition of the bottom electrode surface, on diffusion and segregation processes, and the presence of reactive species on the electrode surface.