High current density triode magnetron sputtering
- 28 May 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 57 (2) , 105-110
- https://doi.org/10.1016/0257-8972(93)90025-j
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Time-dependent simulation modelling of reactivesputteringThin Solid Films, 1990
- Reactive deposition of tin films using an unbalanced magnetronSurface and Coatings Technology, 1989
- The effect of target-substrate coupling on reactive direct current magnetron sputteringSurface and Coatings Technology, 1989
- Advances in partial-pressure control applied to reactive sputteringSurface and Coatings Technology, 1989
- Predicting thin-film stoichiometry in reactive sputteringJournal of Applied Physics, 1988
- High rate reactively sputtered TiN coatings on high speed steel drillsThin Solid Films, 1985
- Effects of substrate temperature and substrate material on the structure of reactively sputtered TiN filmsThin Solid Films, 1984
- Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputteringThin Solid Films, 1984
- Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheresJournal of Vacuum Science & Technology A, 1984
- Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixturesJournal of Vacuum Science and Technology, 1980