Calculation of electron density in planar-doped high electron mobility transistors
- 31 July 1990
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 33 (7) , 953-962
- https://doi.org/10.1016/0038-1101(90)90078-s
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Electronic transport of the delta -doping layer in the dilute density limitSemiconductor Science and Technology, 1989
- Selectively δ-doped quantum well transistor grown by gas-source molecular-beam epitaxyJournal of Applied Physics, 1988
- 0.2- mu m gate-length atomic-planar doped pseudomorphic Al/sub 0.3/Ga/sub 0.7/As/In/sub 0.25/Ga/sub 0.75/As MODFETs with f/sub T/ over 120 GHzIEEE Electron Device Letters, 1988
- Quantum size effect in monolayer-doped heterostructuresPhysical Review B, 1988
- Fundamental studies and device application of ?-doping in GaAs Layers and in AlxGa1?xAs/GaAs heterostructuresApplied Physics A, 1988
- A high-current pseudomorphic AlGaAs/InGaAs double quantum-well MODFETIEEE Electron Device Letters, 1988
- Selectively δ-doped AlxGa1−xAs/GaAs heterostructures with high two-dimensional electron-gas concentrations n2DEG≥1.5×1012 cm−2 for field-effect transistorsApplied Physics Letters, 1987
- GaAs structures with electron mobility of 5×106 cm2/V sApplied Physics Letters, 1987
- Schottky-barrier tunneling spectroscopy for the electronic subbands of a δ-doping layerSolid State Communications, 1986
- Photoconductivity in selectively n- and p-doped AlxGa1−xAs/GaAs heterostructuresSolid-State Electronics, 1986