Charging studies with “CHARM”
Open Access
- 1 April 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 55 (1-4) , 143-147
- https://doi.org/10.1016/0168-583x(91)96151-a
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Ion beam induced wafer chargingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Charging and charge neutralization in ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Analysis and modeling of floating-gate EEPROM cellsIEEE Transactions on Electron Devices, 1986
- Effect of resist patterning on gate oxide integrity in source/drain implantNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985