Titanium disilicide on silicon by interdiffusion of titanium and amorphous silicon multilayers: transmission electron microscopy, spectroscopic ellipsometry and resistivity measurements
- 1 July 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 247 (1) , 44-50
- https://doi.org/10.1016/0040-6090(94)90474-x
Abstract
No abstract availableKeywords
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