Phase separations of amorphous CoW films during oxidation and reactions with Si and Al
- 1 March 1989
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 65 (5) , 1957-1967
- https://doi.org/10.1063/1.342885
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- Reactions of Co/Mo bilayers and amorphous Co50Mo50 alloy films with silicon substratesThin Solid Films, 1988
- Interactions of amorphous alloys with Si substrates and Al overlayersJournal of Applied Physics, 1986
- Thermal stability of the Al/PdxW100−x/Si contact systemsJournal of Applied Physics, 1985
- Reaction of amorphous Ni-W and Ni-N-W films with substrate siliconJournal of Applied Physics, 1984
- Phase separation and layer sequence reversal during silicide formation with Ni-Cr alloys and Ni-Cr bilayersJournal of Applied Physics, 1984
- Stability of amorphous Fe-W alloys in multilayer metallizations on siliconThin Solid Films, 1983
- Shallow silicide contactJournal of Applied Physics, 1980
- Phase separation in alloy-Si interactionApplied Physics Letters, 1980
- Contact reaction between Si and Pd-W alloy filmsJournal of Applied Physics, 1979
- Silicide formation with Pd-V alloys and bilayersJournal of Applied Physics, 1979