Multilayer mirror technology for soft-x-ray projection lithography
- 1 December 1993
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 32 (34) , 6952-6960
- https://doi.org/10.1364/ao.32.006952
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 15 references indexed in Scilit:
- Silicide layer growth rates in Mo/Si multilayersApplied Optics, 1993
- Condenser optics, partial coherence, and imaging for soft-x-ray projection lithographyApplied Optics, 1993
- Chirped multilayer coatings for increased x-ray throughputOptics Letters, 1993
- Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopyJournal of Applied Physics, 1992
- Optimization of growth conditions of vapor deposited Mo/Si multilayersJournal of Applied Physics, 1992
- Fabrication of high-reflectance Mo–Si multilayer mirrors by planar-magnetron sputteringJournal of Vacuum Science & Technology A, 1991
- Normal-incidence x-ray mirror for 7 nmOptics Letters, 1991
- Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μmJournal of Vacuum Science & Technology B, 1990
- Soft x-ray reduction lithography using multilayer mirrorsJournal of Vacuum Science & Technology B, 1989
- Fabrication and testing of large area multilayer coated x-ray opticsApplied Optics, 1989