CMOS Hardening Techniques
- 1 January 1972
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 19 (6) , 275-281
- https://doi.org/10.1109/tns.1972.4326845
Abstract
Complementary symmetry MOS circuits have high noise immunity and low power consumption which make them particularly suitable for military and space applications. A major drawback to their use is radiation sensitivity to accumulated fluences of radiation and also to prompt radiation bursts (transient effects). A significant degree of hardening against transient effects can be achieved by building the circuits in silicon-on-sapphire. This technology provides complete dielectric isolation and reduces photocurrents in the silicon. It is shown that each device type (N and P channel) must operate under both negative and positive gate bias. Therefore, to ensure hardening against an accumulated fluence of radiation, a dielectric which is hard under both polarities of gate bias should be used. Results are presented for CMOS circuits made with Al2O3 gate insulators.Keywords
This publication has 13 references indexed in Scilit:
- Radiation Hardening of P-MOS Devices by Optimization of the Thermal Si02 Gate InsulatorIEEE Transactions on Nuclear Science, 1971
- Electronic Recovery from Radiation Effects in CMNOS StructuresIEEE Transactions on Nuclear Science, 1971
- Short-Term Annealing in p-Type SiliconIEEE Transactions on Nuclear Science, 1970
- Radiation-Insensitive Silicon Oxynitride Films for Use in Silicon DevicesIEEE Transactions on Nuclear Science, 1969
- Radiation resistance of Al2O3MOS devicesIEEE Transactions on Electron Devices, 1969
- Radiation Hardening of Thermal Oxides on Silicon via Ion ImplantationIEEE Transactions on Nuclear Science, 1969
- Effects of Metallic Doping on Ionization Damage in MOS FETSIEEE Transactions on Nuclear Science, 1969
- Radiation resistant MOS devicesIEEE Transactions on Electron Devices, 1968
- Radiation Effects in Modified Oxide Insulators in MOS StructuresIEEE Transactions on Nuclear Science, 1968
- Effect of Electron Radiation on Silicon Nitride Insulated Gate Field Effect TransistorsIEEE Transactions on Nuclear Science, 1967