Adaptation of the charge pumping technique to gated p-i-n diodes fabricated on silicon on insulator
- 1 June 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 38 (6) , 1432-1444
- https://doi.org/10.1109/16.81636
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Characterization of front and back Si-SiO/sub 2/ interfaces in thick- and thin-film silicon-on-insulator MOS structures by the charge-pumping techniqueIEEE Transactions on Electron Devices, 1989
- CHARGE PUMPING IN SILICON ON INSULATOR STRUCTURES USING GATED P-I-N DIODESLe Journal de Physique Colloques, 1988
- Conductance technique in MOSFETs: Study of interface trap properties in the depletion and weak inversion regimesSolid-State Electronics, 1988
- Silicon films on sapphireReports on Progress in Physics, 1987
- A model for the charge-pumping current based on small rectangular voltage pulsesSolid-State Electronics, 1986
- A general model for interface-trap charge-pumping effects in MOS devicesSolid-State Electronics, 1985
- Deep depleted SOI MOSFETs with back potential control: A numerical simulationSolid-State Electronics, 1985
- Positive and negative charge generation by hot carriers in n -MOSFETsElectronics Letters, 1983
- Determination of spatial surface state density distribution in MOS and SIMOS transistors after channel hot electron injectionElectronics Letters, 1982
- Theoretical origins of Nss peaks observed in Gray-Brown MOS studiesApplied Physics Letters, 1973