Influence of temperature on the crystal habit of silicon in the SiHCl CVD system I. Experimental results
- 31 August 1989
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 96 (4) , 821-831
- https://doi.org/10.1016/0022-0248(89)90642-8
Abstract
No abstract availableKeywords
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