Effect of dc bias on the compositional ratio of WNX thin films prepared by rf-dc coupled magnetron sputtering
- 1 January 2001
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 169-170, 362-365
- https://doi.org/10.1016/s0169-4332(00)00683-8
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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