The resolution of the inorganic electron beam resist LiF(AlF3)
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 287-290
- https://doi.org/10.1016/0167-9317(94)90157-0
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Nanostructure fabrication using lithium fluoride films as an electron beam resistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Homogeneous lithium fluoride films as a high resolution electron beam resistMicroelectronic Engineering, 1992
- The resolution of electron beam lithographyMicroelectronic Engineering, 1992
- Nanofabrication using inorganic resistsMicroelectronic Engineering, 1989
- Resolution limits for electron-beam lithographyIBM Journal of Research and Development, 1988
- Progress in self-developing metal fluoride resistsJournal of Vacuum Science & Technology B, 1987
- Barium fluoride and strontium fluoride negative electron beam resistsJournal of Vacuum Science & Technology B, 1987
- Radiolysis and resolution limits of inorganic halide resistsJournal of Vacuum Science & Technology B, 1985