Focused ion beam milling
- 1 November 1986
- Vol. 36 (11-12) , 961-967
- https://doi.org/10.1016/0042-207x(86)90148-x
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Novel Method for Measuring Intensity Distribution of Focused Ion BeamsJapanese Journal of Applied Physics, 1983
- A 100 kV Maskless Ion-Implantation System with an Au–Si–Be Liquid Metal Ion Source for III-V Compound SemiconductorsJapanese Journal of Applied Physics, 1983
- Morphology of copper precipitates characterizing lattice imperfection in EFG ribbon siliconSolid-State Electronics, 1983
- Ion channeling effects in scanning ion microscopy with a 60 keV Ga+ probeNuclear Instruments and Methods in Physics Research, 1983
- High resolution sputtering using a focused ion beamThin Solid Films, 1982
- Ion beam exposure apparatus using a liquid metal sourceThin Solid Films, 1982
- FET fabrication using maskless ion implantationJournal of Vacuum Science and Technology, 1981
- A 100-kV ion probe microfabrication system with a tetrode gunJournal of Vacuum Science and Technology, 1981
- Advances in molten metal field ion sourcesNuclear Instruments and Methods in Physics Research, 1981
- Field-emission liquid-metal ion source and triode ion gunJournal of Applied Physics, 1981