Composition of phosphorus-nitride film deposited on InP surfaces by a photochemical vapor deposition technique and electrical properties of the interface
Open Access
- 17 December 1990
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 57 (25) , 2680-2682
- https://doi.org/10.1063/1.104192
Abstract
No abstract availableKeywords
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